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鏈式酸抛光清洗設備

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設備名稱 Equipment Name

鏈式酸抛光清洗設備  Inline Acid Polishing Equipment

設備型號 Equipment Model

SC-LSP4500/ SC-LSP8000

設備用途 Equipment Application

對單、多晶硅片進行刻蝕/抛光、清洗、幹燥。
Etching/polishing, cleaning and drying of mono/multi crystalline solar cells.

工藝流程 Process Flow

正面保護→刻蝕/抛光→堿洗→酸洗→烘幹
Water layer protection→Etching/Polishing→Alkaline cleaning→Acid Cleaning→Drying.

技術特點  Features

1. 高産能:4500PCS/5道,8000PCS/10道。
High Throughput: 4000pcs/h, 5 lanes; 8000pcs/h, 10 lanes.

2. 高均勻性,超長藥液壽命。
Excellent Uniformity, long bath life time.

3. 支持多種添加劑或混合添加劑技術。
Various additives or mixed additives technology.

4. 支持最薄120μm硅片。
Wafer thickness down to 120μm.

5. 快速換液,在線換液。
Quick inline bath change.

6. ⽀持背面抛光工藝,超低藥耗。
Suitable for rear side polishing and with low chemical consumption.

7. ⽀持MES,選配在線稱重檢測。
Suitable with MES ; Inline weight testing is optional.

8. 兼容酸抛光功能。
Compatible with acid polish function.

設備參數  Parameters